CNSI Core Lab Management System
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Lab: Electron Imaging Center for NanoMachines (EICN)
Equipment: South Bay Technology Ion Beam Sputtering / Etching System, Room B146

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June 01, 2023
 Thursday
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Equipment Color
South Bay Technology Ion Beam Sputtering / Etching System, Room B146     Electron Imaging Center for NanoMachines (EICN)
Quantity: 1     Usage Type: Supportive    
Training Required: Yes     Training Level: 1     Training Service Type: self-service     Approval Required: Yes     Service Type: self-service
Description: The Model IBS/e is a high vacuum thin film deposition system designed to precisely deposit subnanometer grain, conductive coatings onto specimens prior to examination in the electron microscope. Thin, conductive films are deposited onto specimens to prevent charging effects and to enhance contrast. Films are deposited using two ion beam sources directed at a target material, eliminating radiation or heating effects common with other coating techniques. Extremely thin, continuous metal or carbon films are deposited without risking damage to delicate features present on the specimen. Virtually any target material can be used for ion beam deposition with precise control over the deposition thickness. An optional third ion source allows specialized ion beam etching techniques to be employed. The ability to deposit amorphous, continuous films makes the IBS/e system ideal for high resolution electron microscopy techniques.

Rates: Internal Academic rate: $40/hour; External Academic rate: $55/hour; Industry rate: $80/hour

Reservation Details  -  Today's Date/Time: Jun 01 2023, 10:38 pm
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