Lab: Electron Imaging Center for NanoMachines (EICN)
Equipment: South Bay Technology Ion Beam Sputtering / Etching System, Room B146
|South Bay Technology Ion Beam Sputtering / Etching System, Room B146 Electron Imaging Center for NanoMachines (EICN)|
|Quantity: 1 Usage Type: Supportive|
|Training Required: No Training Level: 1 Training Service Type: aid/trainer required Approval Required: Yes Service Type: aid/trainer required|
|Description: The Model IBS/e is a high vacuum thin film deposition system designed to precisely deposit subnanometer grain, conductive coatings onto specimens prior to examination in the electron microscope. Thin, conductive films are deposited onto specimens to prevent charging effects and to enhance contrast. Films are deposited using two ion beam sources directed at a target material, eliminating radiation or heating effects common with other coating techniques. Extremely thin, continuous metal or carbon films are deposited without risking damage to delicate features present on the specimen. Virtually any target material can be used for ion beam deposition with precise control over the deposition thickness. An optional third ion source allows specialized ion beam etching techniques to be employed. The ability to deposit amorphous, continuous films makes the IBS/e system ideal for high resolution electron microscopy techniques.
The targets currently available in the systems are: Ir, Ni and In2O3.
The thickness of Ir layer deposited at 0 deg stage by two guns (3ma + 3ma) at 8kV is ~11 angstroms per minute.
The max vacuum is 10-7 torr, the vacuum at deposition is 10-5 torr.
The ionizing gas is argon.
Tilting and rotating stage for up to 6 Zeiss ½” stubs.
Rates: Internal Academic rate: $40/hour; External Academic rate: $55/hour; Industry rate: $80/hour